Abstract:
In this work the influence of a short-pulsed ion irradiation with a high flux (~5.5•1019 cm− 2
s
− 1
) on structure,
optical and photo-electrical properties of gallium oxide thin films have been investigated. The films were pro
duced by the radio-frequency magnetron sputtering method. A part of deposited films was annealed in the air
environment (900 ◦C, 2 h) for synthesis of β-Ga2O3 phase. Obtained films were subjected to the short-pulsed ion
irradiation (ion energy - up to 200 keV, pulse duration - 90 ns, current density on the target - up to 15 A/cm2
).
The influence of the annealing and the irradiation on spectral dependences of absorption, the bandgap width and
the Urbach energy have been determined. It was found that irradiation leads to amorphization of crystalline
β-Ga2O3 films and a significant change in optical characteristics. In addition, we measured the magnitude of
surface dark and photoconductivity of the films. Also, the field and spectral dependences of the photosensitivity
of the films were researched. As a result, it was established that short-pulsed irradiation improves the photo
electric properties of amorphous gallium oxide films. The reasons of it are discussed.
